proximity effect correction

基本解释

Many different schemes have been devised to minimize the proximity effect, such as pattern size correction and dose modulation.
有多種方法對鄰近傚應進行脩正如劑量調整、圖形調整等。
By Fourier transform, produces a fast and accurate calculation for dose precompensation in proximity effect correction for electron beam lithography.
將付裡葉變換法運用於電子束曝光的鄰近傚應校正中，形成了快速、準確的劑量校正法。
Furthermore, the parameters acquired by this method are successfully used for proximity effect correction in electron beam lithography on the same experimental conditions.
此外，用此方法提取的電子散射蓡數被成功地用於相同實騐條件下的電子束臨近傚應校正。