scanning electron beam lithography
常见例句
- The deflection system of an electron beam lithography tool is used to control deflection scanning of electron beam.
電子束曝光機的偏轉系統控制電子束偏轉掃描。 - These techniques include molecular assembly, arrangement of nano particles, scanning force microscopy fabrication and nano lithography based on photon beam, electron beam, and ion beam.
結果對基於分子組裝與納米光刻的納料制造技術給予很大的重眡。 返回 scanning electron beam lithography